Now showing documents 1-4 of 4
Silicon nitride nanotemplate fabrication using inductively coupled plasma etching process
Abstract : In this work, we have investigated the fabrication of ordered silicon nitride nanohole arrays as part of an overall process aimed at producing organized silicon nanocrystals. The authors have demonstrated that ...
Organization of silicon nanocrystals by localized electrochemical etching
Abstract : An approach to form a monolayer of organized silicon nanocrystals on a monocrystalline Si wafer is reported. Ordered arrays of nanoholes in a silicon nitride layer were obtained by combining electron beam ...
Direct-write electron beam lithography in silicon dioxide at low energy
Abstract : Electron beam lithography in silicon dioxide has been investigated with energies ranging from 0.5 up to 6 keV. The etch ratio of SiO2SiO2 has been studied and interpreted with regard to the limited penetration ...
Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating
Abstract : A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask ...