Now showing documents 1-6 of 6
Deep germanium etching using time multiplexed plasma etching
Abstract : There is a growing need for patterning germanium for photonic and photovoltaics applications. In this paper, the authors use a time multiplexed plasma etch process (Bosch process) to deep etch a germanium ...
Organization of silicon nanocrystals by localized electrochemical etching
Abstract : An approach to form a monolayer of organized silicon nanocrystals on a monocrystalline Si wafer is reported. Ordered arrays of nanoholes in a silicon nitride layer were obtained by combining electron beam ...
Fabrication of x-ray masks using evaporated electron sensitive layers for back patterning of membranes
Abstract : A process aimed at fabricating proximity x-ray lithography masks is presented. In this technique, the Ta absorber layer is deposited and patterned on the back side of the membrane and nonspin-coated electron ...
Selective dry etching of TiN nanostructures over SiO2 nanotrenches using a CI2/Ar/N2 inductively coupled plasma
Abstract : An inductively coupled plasma etch process for the fabrication of TiN nanostructures over nanotopography is presented. Using a Cl2/Ar/N2 plasma, a selectivity of 50 is achieved over SiO2. The effect of N2 ﬂow ...
Technology platform for the fabrication of titanium nanostructures
Abstract : This paper presents two approaches for the fabrication of top-down titanium nanostructures. The first approach involves electron beam lithography followed by a tailored titanium plasma etching. The two main ...
Silicon nitride nanotemplate fabrication using inductively coupled plasma etching process
Abstract : In this work, we have investigated the fabrication of ordered silicon nitride nanohole arrays as part of an overall process aimed at producing organized silicon nanocrystals. The authors have demonstrated that ...