Now showing documents 1-4 of 4
Depletion layer imaging using a gaseous secondary electron detector in an environmental scanning electron microscope
Abstract : We present a method for imaging depletion layers using the gaseous secondary electron detector (GSED) employed in environmental scanning electron microscopes. GSED images of a p-np-n junction were obtained from ...
Method for fabricating submicron silicide structures on silicon using a resistless electron beam lithography process
Abstract : A novel resistless lithography process using a conventional electron beam system is presented. Metallic lines with widths of less than 50 nm were produced on silicon substrates. The process is based on localized ...
A non linear analysis for clean and noisy speech
Abstract: The research in speech analysis is recognized to be an important aspect in the area of speech processing, with applications in speech coding, speech recognition, etc. Depending on the application, the speech ...
Resistless electron beam lithography process for the fabrication of sub-50 nm silicide structures
We report on a study of the fabrication of submicron silicide structures with a resistless lithography technique. Several different metals can be used as a basis for producing silicide using this method; in this work, ...