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AuthorBeaumont, Arnaud (1)
Beauvais, Jacques (1)
Drouin, Dominique (1)Subject
Collisonal energy loss (1)
Electron beams (1)
Etching (1)
Nanofabrication (1)Silicon (1)... View MorePublication date2010 (1)Types of document
Article (1)

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Direct-write electron beam lithography in silicon dioxide at low energy

Beaumont, Arnaud, Dubuc, Christian, Beauvais, Jacques, Drouin, Dominique (2010)
Abstract : Electron beam lithography in silicon dioxide has been investigated with energies ranging from 0.5 up to 6 keV. The etch ratio of SiO2SiO2 has been studied and interpreted with regard to the limited penetration ...

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