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Direct-write electron beam lithography in silicon dioxide at low energy

Beaumont, Arnaud, Dubuc, Christian, Beauvais, Jacques, Drouin, Dominique (2010)

Abstract : Electron beam lithography in silicon dioxide has been investigated with energies ranging from 0.5 up to 6 keV. The etch ratio of SiO2SiO2 has been studied and interpreted with regard to the limited penetration ...