Now showing documents 1-4 of 4
Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating
Abstract : A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask ...
Raman study of As outgassing and damage induced by ion implantation in Zn-doped GaAs
Abstract : Room temperature micro-Raman investigations of LO phonon and LO phonon-plasmon coupling is used to study the AsAs outgassing mechanism and the disordering effects induced by ion implantation in ZnZn-doped GaAsGaAs ...
Single-electron transistors with wide operating temperature range
Abstract : Single-electron transistors are fabricated with a planar self-aligned process using chemical mechanical polishing. The method is demonstrated with Ti∕TiOxTi∕TiOx junctions and resistless lithography. The device ...
Organization of silicon nanocrystals by localized electrochemical etching
Abstract : An approach to form a monolayer of organized silicon nanocrystals on a monocrystalline Si wafer is reported. Ordered arrays of nanoholes in a silicon nitride layer were obtained by combining electron beam ...