Now showing documents 1-2 of 2
Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating
Abstract : A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask ...
Method for fabricating submicron silicide structures on silicon using a resistless electron beam lithography process
Abstract : A novel resistless lithography process using a conventional electron beam system is presented. Metallic lines with widths of less than 50 nm were produced on silicon substrates. The process is based on localized ...