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Technology platform for the fabrication of titanium nanostructures
(2011)
Abstract : This paper presents two approaches for the fabrication of top-down titanium nanostructures. The first approach involves electron beam lithography followed by a tailored titanium plasma etching. The two main ...
A fabrication process for emerging nanoelectronic devices based on oxide tunnel junctions
(2017)
Abstract : We present a versatile nanodamascene process for the realization of low-power nanoelectronic devices with different oxide junctions. With this process we have fabricated metal/insulator/metal junctions, metallic ...
Silicon nitride nanotemplate fabrication using inductively coupled plasma etching process
(2011)
Abstract : In this work, we have investigated the fabrication of ordered silicon nitride nanohole arrays as part of an overall process aimed at producing organized silicon nanocrystals. The authors have demonstrated that ...
Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating
(2004)
Abstract : A critical issue in fabricating arrays of holes is to achieve high-aspect-ratio structures. Formation of ordered arrays of nanoholes in silicon nitride was investigated by the use of ultrathin hard etch mask ...
Selective dry etching of TiN nanostructures over SiO2 nanotrenches using a CI2/Ar/N2 inductively coupled plasma
(2016)
Abstract : An inductively coupled plasma etch process for the fabrication of TiN nanostructures over nanotopography is presented. Using a Cl2/Ar/N2 plasma, a selectivity of 50 is achieved over SiO2. The effect of N2 flow ...
Chemical composition of nanoporous layer formed by electrochemical etching of p-type GaAs
(2016)
Abstract : We have performed a detailed characterization study of electrochemically etched p-type GaAs in a hydrofluoric acid-based electrolyte. The samples were investigated and characterized through cathodoluminescence ...
Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering
(2014)
Abstract : The development of metallic single electron transistor (SET) depends on the downscaling and the electrical properties of its tunnel junctions. These tunnel junctions should insure high tunnel current levels, low ...
A silicone nanocrystal tunnel field effect transistor
(2014)
Abstract : In this work, we demonstrate a silicon nanocrystal Field Effect Transistor (ncFET). Its operation is similar to that of a Tunnelling Field Effect Transistor (TFET) with two barriers in series. The tunnelling ...
Contributions à l'avancement de techniques de caractérisation de semiconducteur au microscope électronique à balayage
(Université de Sherbrooke, 1998)
Dans le cadre de ce projet de doctorat, plusieurs contributions importantes ont été apportées aux domaines scientifiques. Premièrement, un programme de simulation de trajectoire d'électrons dans un solide par la méthode ...
Resistless electron beam lithography process for the fabrication of sub-50 nm silicide structures
(1997)
We report on a study of the fabrication of submicron silicide structures with a resistless lithography technique. Several different metals can be used as a basis for producing silicide using this method; in this work, ...