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dc.contributor.authorEcoffey, Sergefr
dc.contributor.authorGuilmain, Marcfr
dc.contributor.authorMorissette, Jean-Françoisfr
dc.contributor.authorBourque, Frédéricfr
dc.contributor.authorPont, Jérémyfr
dc.contributor.authorSang, Bruno Leefr
dc.contributor.authorDrouin, Dominiquefr
dc.date.accessioned2017-10-06T15:24:50Z
dc.date.available2017-10-06T15:24:50Z
dc.date.created2011fr
dc.date.issued2017-10-06
dc.identifier.urihttp://hdl.handle.net/11143/11326
dc.description.abstractAbstract : This paper presents two approaches for the fabrication of top-down titanium nanostructures. The first approach involves electron beam lithography followed by a tailored titanium plasma etching. The two main challenges of this process lie in the optimization of the negative tone Ma–N electroresist resolution and in the definition of a controlled titanium etching process for titanium patterns less than 20 nm thick and wide. The second proposed approach is a damascene process where the titanium nanostructures are buried in the oxide. Very shallow and narrow (20 nm × 20 nm) trenches are first patterned in the oxide and nanostructures are obtained by planarization of an evaporated titanium film. The dimensions of the structures are defined by the electron beam lithography resolution and the etching recipe. The third dimension is given by the titanium or any other metal thickness and can be controlled down to few nanometers thanks to the planarization step.fr
dc.language.isoengfr
dc.relation.isformatofdoi:http://dx.doi.org/10.1116/1.3657517fr
dc.relation.ispartofISSN:2166-2754fr
dc.relation.ispartofJournal of vacuum science & technology. B, Nanotechnology and microelectronics : materials, processing, measurement, and phenomenafr
dc.rightsAttribution - Pas d’Utilisation Commerciale - Pas de Modification 2.5 Canada*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.5/ca/*
dc.subjectTitaniumfr
dc.subjectNanofabricationfr
dc.subjectEtchingfr
dc.subjectPlasma etchingfr
dc.subjectNanostructuresfr
dc.titleTechnology platform for the fabrication of titanium nanostructuresfr
dc.typeArticlefr
udes.description.typestatusPost-publicationfr
udes.description.typepubRévisé et accepté par des pairsfr
udes.description.pages06FG06-1-06FG06-4fr
udes.description.period29,06FG06(2011)fr
udes.description.diffusionDiffusé par Savoirs UdeS, le dépôt institutionnel de l'Université de Sherbrookefr
dc.identifier.bibliographicCitationEcoffey, S., Guilmain, M., Morissette, J.-F., Bourque, F., Pont, J., Sang, B. L., Drouin, D. (2011). Technology platform for the fabrication of titanium nanostructures. Journal of vacuum science & technology. B, Nanotechnology and microelectronics : materials, processing, measurement, and phenomena, 29,06FG06(2011), 06FG06-1-06FG06-4. doi:http://dx.doi.org/10.1116/1.3657517fr
udes.description.sourceJournal of vacuum science & technology. B, Nanotechnology and microelectronics : materials, processing, measurement, and phenomenafr
udes.autorisation.depottruefr
udes.description.ordreauteursEcoffey, Serge; Guilmain, Marc; Morissette, Jean-François; Bourque, Frédéric; Pont, Jérémy; Sang, Bruno Lee; Drouin, Dominiquefr


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