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    • Deep germanium etching using time multiplexed plasma etching

      Darnon, Maxime; De Lafontaine, Mathieu; Volatier, Maïté; Fafard, Simon; Arès, Richard; Jaouad, Abdelatif; Aimez, Vincent (2015)
      Abstract : There is a growing need for patterning germanium for photonic and photovoltaics applications. In this paper, the authors use a time multiplexed plasma etch process (Bosch process) to deep etch a germanium ...